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Applications;
- Fiber Bragg grating writing
- Photoablation and micromachining
- Semiconductor processing
- Surface analysis
- Laser ionization mass spectroscopy
- Fluorescence spectroscopy
- Photochemistry
- Relaxation time studies
- Nonlinear optics
 
Model Wavelength
(nm)
Pulse Energy
(mJ)
Description
PSX-100 157 1.0 F2
PSX-100 193 4.0 ArF
PSX-100 222 0.3 KrCl
PSX-100 248 5.0 KrF
PSX-100 308 2.0 XeCl
PSX-100 351 1.5 XeF
Ximer 300 157 1.3 F2
Ximer 300 193 7 ArF
Ximer 300 248 8.5 KrF
MSX-250 157 1.3 F2
MSX-250 157 4 F2
MSX-250 248 50 KrF
MSX-250 308 30 XeCl
MSX-250 351 35 XeF
ASX-750 193 220 ArF
ASX-750 248 360 KrF
ASX-750 308 270 XeCl
ASX-750 351 140 XeF